-
Notifications
You must be signed in to change notification settings - Fork 15
/
Copy pathTechnology.h
87 lines (75 loc) · 4.26 KB
/
Technology.h
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
26
27
28
29
30
31
32
33
34
35
36
37
38
39
40
41
42
43
44
45
46
47
48
49
50
51
52
53
54
55
56
57
58
59
60
61
62
63
64
65
66
67
68
69
70
71
72
73
74
75
76
77
78
79
80
81
82
83
84
85
86
87
//Copyright (c) 2015-2016, UT-Battelle, LLC. See LICENSE file in the top-level directory
// This file contains code from NVSim, (c) 2012-2013, Pennsylvania State University
//and Hewlett-Packard Company. See LICENSE_NVSim file in the top-level directory.
// This file contains code from CACTI-3DD, (c) 2012 Hewlett-Packard Development Company, L.P.
//See LICENSE_CACTI3DD file in the top-level directory.
//No part of DESTINY Project, including this file, may be copied,
//modified, propagated, or distributed except according to the terms
//contained in the LICENSE file.
#ifndef TECHNOLOGY_H_
#define TECHNOLOGY_H_
#include <iostream>
#include "typedef.h"
#include "InputParameter.h"
#include "constant.h"
#include "MemCell.h"
using namespace std;
class Technology {
public:
Technology();
virtual ~Technology();
/* Functions */
void PrintProperty();
void Initialize(int _featureSizeInNano, DeviceRoadmap _deviceRoadmap, InputParameter *inputParameter);
void InterpolateWith(Technology rhs, double _alpha);
/* Properties */
bool initialized; /* Initialization flag */
int featureSizeInNano; /*Process feature size, Unit: nm */
double featureSize; /* Process feature size, Unit: m */
DeviceRoadmap deviceRoadmap; /* HP, LSTP, or LOP */
double vdd; /* Supply voltage, Unit: V */
double vpp; /* Wordline overdrive voltage. */
double vth; /* Threshold voltage, Unit: V */
double vdsatNmos; /* Velocity saturation voltage, Unit: V */
double vdsatPmos; /* Velocity saturation voltage, Unit: V */
double phyGateLength; /* Physical gate length, Unit: m */
double capIdealGate; /* Ideal gate capacitance, Unit: F/m */
double capFringe; /* Fringe capacitance, Unit: F/m */
double capJunction; /* Junction bottom capacitance, Cj0, Unit: F/m^2 */
double capOverlap; /* Overlap capacitance, Cover in MASTAR, Unit: F/m */
double capSidewall; /* Junction sidewall capacitance, Cjsw, Unit: F/m */
double capDrainToChannel; /* Junction drain to channel capacitance, Cjswg, Unit: F/m */
double capOx; /* Cox_elec in MASTAR, Unit: F/m^2 */
double buildInPotential; /* Bottom junction built-in potential(PB in BSIM4 model), Unit: V */
double effectiveElectronMobility; /* ueff for NMOS in MASTAR, Unit: m^2/V/s */
double effectiveHoleMobility; /* ueff for PMOS in MASTAR, Unit: m^2/V/s */
double pnSizeRatio; /* PMOS to NMOS size ratio */
double effectiveResistanceMultiplier; /* Extra resistance due to vdsat */
double currentOnNmos[101]; /* NMOS saturation current, Unit: A/m */
double currentOnPmos[101]; /* PMOS saturation current, Unit: A/m */
double currentOffNmos[101]; /* NMOS off current (from 300K to 400K), Unit: A/m */
double currentOffPmos[101]; /* PMOS off current (from 300K to 400K), Unit: A/m */
double capPolywire; /* Poly wire capacitance, Unit: F/m */
double capTSV[NUM_TSV_TYPES];
double resTSV[NUM_TSV_TYPES];
double areaTSV[NUM_TSV_TYPES];
double tsv_resistance(double resistivity, double tsv_len, double tsv_diam, double tsv_contact_resistance);
double tsv_capacitance(double tsv_len, double tsv_diam, double tsv_pitch, double dielec_thickness, double liner_dielectric_constant, double depletion_width);
double tsv_area(double tsv_pitch);
TSV_type WireTypeToTSVType(int wiretype);
void SetLayerCount(InputParameter *inputParameter, int layers); /* Recalculate TSV parameters based on layer count */
private:
// TSV parameters from CACTI3DD model
int layerCount;
double tsv_pitch[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_diameter[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_length[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_dielec_thickness[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_contact_resistance[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_depletion_width[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_liner_dielectric_constant[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_parasitic_res[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_parasitic_cap[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
double tsv_occupation_area[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUM_TSV_TYPES];
};
#endif /* TECHNOLOGY_H_ */